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NANO PRO Magnesium Oxide Sputtering Target MgO

SKU:
TA7200
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NANO PRO Magnesium Oxide Sputtering Target MgO

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Global Head Office

Email: Marknanossr@gmail.com

Tel：+86 15606950920

Wechat: 15606950920

Address:  Building 1, No. 39 Xinchang Road, Haicang District, Xiamen City, Fujian Province, China

Specifications

To add a Cu Backing Plate with Indium Bonding for Sputtering Targets  

  • Melting point: 2852°C
  • Purity: 99.99%
  • Density: 3.58 g/cm3
  • Solubility: soluble in acid
  • Linear expansion coefficient: 10.8 x 10-6/K(300K)
  • Specific heat capacity: 0.209 Cal/g.K(273K)
  • Hardness: (acc. to Mohs) 5.5, (acc. to Knoop) 692 g/mm2
  • Properties of thin film---
  1. Transmission range 200 - 8000nm
  2. Refractive index at 550nm 1.73, at 1014nm 1.72, at 2325nm 1.70, at 5138nm 1.63
  • Hints on evaporation:
  1. Evaporation with electron beam gun.
  2. Evaporation pressure ~10-3Pa
  • Shape---solid substance, White tablets


    Specifications for Magnesium Oxide Sputtering Target

    • Boiling Point 760 mm Hg: 3600 oC
    • Melting Point: 2852 oC
    • Specific Gravity: 3.60
    • Appearance and Odor: White to gray powder, odorless
    • Solubility in H2O: Slightly (

    Magnesium Oxide Sputtering Target Features

    • Purity--- 99.99%
    • Shape---Discs, Plate,Step (Dia 300mm, Thickness 1mm) Rectangle, Sheet, Step (Length 300mm, Width 300mm, Thickness 1mm)

    Magnesium Oxide Wafer

    • Shape--- disk, sheet, tube, step, taper
    • Purity--- 99.99%
    • Diameter--- 30-300mm
    • Length--- 300mm    Width: 300mm
    • Thickness--- 0.5-100mm

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